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Study of the Surface Condition for Surface-Activation Bonding of Si-Si Wafers

Miki INAMURA, Noriko YOSHIDA, Tomohiro ODA, Tomoyuki ABE, Hideyuki ABE, Isao KUSUNOKI
2009 Journal of the Vacuum Society of Japan  

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doi:10.3131/jvsj2.52.114 fatcat:4uzcxfviurhxzescrf6dboieom
Citation

Miki INAMURA, Noriko YOSHIDA, Tomohiro ODA, Tomoyuki ABE, Hideyuki ABE, Isao KUSUNOKI. "Study of the Surface Condition for Surface-Activation Bonding of Si-Si Wafers." Journal of the Vacuum Society of Japan 52.3 (2009) 114-116