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Micro & Nano Letters
This work proposed a pure-metal, single-proof-mass structure fabricated by the standard 0.18 μm one-poly-silicon six-metal (1P6M) CMOS process along with one inhouse post-CMOS wet-etching approach. The implemented state-of-the-art symmetrical tri-axis accelerometer consists of the disk-like mezzanine proof-mass and four diagonal double-layered springs. Three sets of the addressable quadrant electrodes underneath the proof-mass with additional interlayer inter-digital comb-conductors help todoi:10.1049/mna2.12014 fatcat:xsvritixr5cungrsu2nguxgaoq