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Intense plasma discharge source at 135 nm for extreme-ultraviolet lithography
1997
Optics Letters
Preserved Fulltext
We measured an emission of 6 mJ͞pulse at 13.5 nm produced by the Li 21 Lyman-a transition excited by a fast capillary discharge, using a lithium hydride capillary. 75% of the energy emanated from a spot size of 0.6 mm. The emission is narrow band and would thus be useful in extreme-ultraviolet lithography imaging systems that use Mo:Si multilayer mirrors. The output within the bandwidth of Mo:Si mirrors was comparable with that of a laser-produced plasma (LPP), and the wallplug efficiency of
doi:10.1364/ol.22.000034
pmid:18183094
fatcat:42q5cqy6zzdcphgyi36dqdqehq