The use of high aspect ratio photoresist (SU-8) for super-hydrophobic pattern prototyping

Neil J Shirtcliffe, Sanaa Aqil, Carl Evans, Glen McHale, Michael I Newton, Carole C Perry, Paul Roach
2004 Journal of Micromechanics and Microengineering  
doi:10.1088/0960-1317/14/10/013 fatcat:of3y5uzl3bbhbgh5ngmmo7rq2i