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Optimization of x-ray sources for proximity lithography produced by a high average power Nd:glass laser. Revision 1
[report]
1995
unpublished
We measured the conversion efficiency of laser pulse energy into keV x-rays from a variety of solid planar targets and a Xe gas puff target irradiated using a high average power Ndglass slab laser capable of delivering 13 ns FWHM pulses at up to 20 J at 1.053 pm and 12 J at 0.53 pm: wavelength band, including L-shell emission from materials with atomic numbers the range Z=24-30 and M-shell emission from Xe (Z=54). With 1.053 pm a maximum conversion of 11% into 2n sr was measured from solid Xe
doi:10.2172/135528
fatcat:ha7z2lnnwfgtzo5vsoomiwnyha