Parameters required to simulate electric characteristics of SiC devices for n-type 4H–SiC

Sou Kagamihara, Hideharu Matsuura, Tetsuo Hatakeyama, Takatoshi Watanabe, Mitsuhiro Kushibe, Takashi Shinohe, Kazuo Arai
2004 Journal of Applied Physics  
In order to obtain some of the parameters required to simulate the electric characteristics of silicon carbide (SiC) power electronic devices in a wide temperature range from startup temperatures ͑ഛ30°C͒ to steady-operation temperatures ͑ജ200°C͒, we discuss the dependence of the two donor levels on the total donor density ͑N D ͒ as well as the dependence of the electron mobility on the total impurity density ͑N imp ͒ and operating temperature ͑T͒ in the n-type 4H-SiC. The temperature-dependent
more » ... perature-dependent electron concentration n͑T͒ and electron mobility n ͑T͒ in the n-type 4H-SiC epilayers with several nitrogen-doping densities are obtained from the Hall-effect measurements. By the graphical peak analysis method (free carrier concentration spectroscopy: FCCS) without any assumptions regarding the donor species, the two types of donor species are detected from n͑T͒. Moreover, the energy level and density of each donor species are determined by the FCCS. Using these results, we obtain the parameters with which the dependence of each donor level on N D can be simulated. Using n ͑T͒ at T Ͼ 250 K, moreover, we obtain the parameters with which the dependence of the electron mobility on N imp and T can be simulated.
doi:10.1063/1.1798399 fatcat:wrsw5jvrybfwtenbdfymop6hne