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Chemical vapor deposition (CVD) has been demonstrated as a highly promising technique for the production of graphene on large scale and enabling tunability of the intrinsic defects of the films during the synthesis. In this work, we report on the correlation between the density of defects (DoD) and the kinetics of interaction of multi-layered graphene (MLG) with nitrogen dioxide (NO 2 ) used as a target gas. We grow MLG on a pre-patterned molybdenum (Mo) catalyst layer, tailoring the DoD whiledoi:10.1016/j.cartre.2021.100024 fatcat:x435ufyeibc2rc7ehguuza2o2q