This study was a comparative analysis of the artificial degradation of silk by Xenon arc lamp, long-wavelength ultraviolet(UV-A), and dry heat. Two types of silk specimens with different thicknesses were treated under each condition for 24, 72, 120, and 168 hours. Tensile strength, yellowing index, and fiber surface changes were analyzed. Deterioration behavior after treatment was examined. The factor that most rapidly promoted degradation was UV-A exposure. The Xenon arc lamp produced a gentle

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... decrease in tensile strength and a low yellowness index. Heat produced little change in the physical properties of the silk specimens. The comparative data indicated that silk degradation upon exposure to Xenon arc lamp was slow, with a low yellowness index. Thus, Xenon arc lamp is acceptable for the conservation of textile cultural heritage, along with reinforcement by sewing.