The impact of a large bandgap drift region in long-wavelength metamorphic photodiodes

J.H. Jang, G. Cueva, D.C. Dumka, W.E. Hoke, P.J. Lemonias, P. Fay, I. Adesida
2001 IEEE Photonics Technology Letters  
A comparative study of two types of metamorphic double heterojunction long-wavelength photodiodes on GaAs substrates is performed in terms of their bandwidths and responsivities. A P-i-I-N heterostructure with a large bandgap drift layer (I-InAlAs) at the cathode end of the photoabsorption region (i-InGaAs) is compared experimentally and theoretically to a P-i-N structure without a drift layer. Both types of photodiodes were fabricated using an InGaAs-InGaAlAs-InAlAs double heterostructure
more » ... eterostructure design to simultaneously achieve high bandwidths and high responsivities. The inclusion of an I-InAlAs drift region resulted in P-i-I-N photodiodes with larger bandwidths than P-i-N photodiodes with the same areas, or conversely a P-i-I-N photodiode can be made larger than a comparable P-i-N photodiode, but achieve the same bandwidth. Therefore, P-i-I-N photodiodes provide larger optical fiber alignment tolerances and better coupling efficiency than P-i-N photodiodes with the same bandwidths. P-i-I-N photodiodes with 10-m-diameter optical windows typically exhibited low dark currents of 500 pA at 5-V bias, responsivities of 0.6 A/W, and a 3-dB bandwidth of 38 GHz for 1.55-m operation. Index Terms-GaAs, InGaAs, metamorphic, photodiodes, P-i-I-N, P-i-N.
doi:10.1109/68.950747 fatcat:bcjehwrmajay7jilgzfz4g4p2a