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The peculiarities of buried layer formation obtained by co-implantation of O 2 ions with the energy of 130 keV and carbon ions within the energy range of 30-50 keV have been investigated. The corresponding ion doses for carbon and oxygen ions were equal to and , respectively. It has been observed that annealing at 1150 °C results in enhanced oxygen diffusion towards the region with a maximum carbon concentration. Analysis of X-ray diffraction patterns with a SIMS depth profiles inherent todoi:10.15407/spqeo14.03.269 fatcat:agp6rypx2bddpnifexfus44bty