Monte Carlo Simulation of Nanoscale Material Focused Ion Beam Gas-Assisted Etching: Ga+ and Ne+ Etching of SiO2 in the Presence of a XeF2 Precursor Gas

Kyle Mahady, Shida Tan, Yuval Greenzweig, Amir Raveh, Philip Rack
2019 Nanoscale Advances  
Elucidating energetic particle-precursor gas-solid interactions is critical to many atomic and nanoscale synthesis approaches. Focused ion beam (FIB) sputtering and gas-assisted etching are among the more commonly used direct-write nanomachining...
doi:10.1039/c9na00390h fatcat:nm6dto5c4rbjji6ni4xc35x7ai