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International Journal of Technical Research and Applications
Nanocrystalline n-typeTiO2 thin film is coated on high porosity porous silicon (PS) by sol-gel spin coating method. TiO2 was infiltrated into the pores of PS and thereby making active layer. X-ray diffraction (XRD), Scanning electron microscopy (SEM), Photoluminescence (PL) and Fourier transform infrared spectroscopy (FTIR) studies have been carried out to examine the characteristics of TiO2/PS structure. XRD results confirm the formation of high quality TiO2 tetragonal structure on PS surfacefatcat:k7esj7qnfzbfjmv6tp7pyd2rkm