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In this CRADA, Oak Ridge National Laboratory (ORNL) assisted d i n e Corporation of Austin, TX in the development of prototype semiconductor wafer inspection tools based on the direct-todigital holographic (DDH) techniques invented at ORNL. Key components of this work included, development of the first prototype named the Visible Alpha Tool (VAT) that uses visible spectrum illumination of 532nm, assist in design of second prototype tool named the DUV Alpha Tool @AT) using deep UV (266nm)doi:10.2172/932949 fatcat:jtcbxqth4vfcheyl6feqffw5la