ErBa: Cu,O, , films have been produced by simultaneous deposition of Er, Ba, and Cu from three ionized cluster beam (ICB) sources at acceleration voltages of 0.3-0.5 kV. Combining ozone oxidation with ICB deposition at 650 °C eliminated any need of post anneal processing. The substates were rotated at 10 rotations per minute during the deposition which too!: place at a rate _ffabout 3 to 4 am. ErBa: Cu_ O:. , films with areas up to 70 mm in diameter have been made by ICB depositi_m These film_.

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... 100-nm thick, were deposited on SrTiO 3 (100) substrates at 650 °C in a mixture of_ at. % O, in O_ at a total pressure of 4x 10 4 Torr. They had T, ranging fiom ,',4.3 to 86.<', K over a 70 mm diameter and J, abme 10 _ A/cm z at 77 K. Another set of three _amples. deposited within a 50 mm diameter, was examined by magnetization measurement', liacse sample, had J ranging from 8.2X 10'> to 1.