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Rapid X-ray Fabrication of Microstructured Polytetrafluoroethylene Substrates by Anisotropic, Pyrochemical Microetching

Akinobu Yamaguchi, Hideki Kido, Yuichi Utsumi
2016 Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi)  

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We investigate the anisotropic, pyrochemical microetching of poly(tetrafluoroethylene) (PTFE) using X-ray-induced decomposition and scission initiated by synchrotron radiation. The dependence of the anisotropic, pyrochemical-etching characteristics on X-ray photon energy is investigated by comparing the etching depths produced by two beam lines with different X-ray photon energies. Higher X-rays penetrate deeper into the PTFE substrate, resulting deeper etching depth than that by low-energy
more » ... ys. The anisotropic, pyrochemical-etching process sheds light on the fabrication of microfluidic devices and Lab-on-a-Chip made from high-precision PTFE microstructures.
doi:10.2494/photopolymer.29.403 fatcat:dnjkld4tzzc2rn4x3yskfebhve
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Akinobu Yamaguchi, Hideki Kido, Yuichi Utsumi. "Rapid X-ray Fabrication of Microstructured Polytetrafluoroethylene Substrates by Anisotropic, Pyrochemical Microetching." Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi) 29.3 (2016) 403-407