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We investigate the anisotropic, pyrochemical microetching of poly(tetrafluoroethylene) (PTFE) using X-ray-induced decomposition and scission initiated by synchrotron radiation. The dependence of the anisotropic, pyrochemical-etching characteristics on X-ray photon energy is investigated by comparing the etching depths produced by two beam lines with different X-ray photon energies. Higher X-rays penetrate deeper into the PTFE substrate, resulting deeper etching depth than that by low-energydoi:10.2494/photopolymer.29.403 fatcat:dnjkld4tzzc2rn4x3yskfebhve