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Aspheric optical surfaces are often tested using computer-generated holograms (CGHs). For precise measurement, the wavefront errors caused by the CGH must be known and characterized. A parametric model relating the wavefront errors to the CGH fabrication errors is introduced. Methods are discussed for measuring the fabrication errors in the CGH substrate, duty cycle, etching depth, and effect of surface roughness. An example analysis of the wavefront errors from fabrication nonuniformities fordoi:10.1364/ao.46.000657 pmid:17279150 fatcat:fvpzzhmysngdraf6hxknxzqcba