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Measurement of Wafer Focus by Grating Shearing Interferometry

Jian Wang, Song Hu, Xianchang Zhu
2020 Applied Sciences  
A method applied for improving the measurement precision and efficiency of wafer focusing in an optical lithography instrument (OLI) is introduced. Based on grating shearing interferometry, the defocus and tilt of the wafer are measured by testing the phase difference in the interference pattern. To validate the feasibility, an experiment is implemented, of which the measurement precision is indicated as 30 nm due to the high precision of phase-resolving arithmetic after analyzing the
more » ... yzing the measurement uncertainty and indicating the precision by interferometer.
doi:10.3390/app10217467 fatcat:uwalypyvsbdbxds2ctfggvrrga