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Particle Transport Process During Sputter Deposition Process in the Pressure Range of 2-20 Pa
中高圧力下(2〜20Pa)のスパッタリングにおける粒子輸送過程

Takeo NAKANO
2002 Shinku  
doi:10.3131/jvsj.45.699 fatcat:ubhmubtixneqtdpekixbtofly4