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Optimal Determination of the Fabrication Parameters in Focused Ion Beam for Milling Gold Nano Hole Array
금 나노홀 어레이 제작을 위한 집속 이온빔의 공정 최적화

Eun Byurl Cho, Hee Min Kwon, Hee Sun Lee, Jong-Souk Yeo
2013 Applied Science and Convergence Technology  
Though focused ion beam (FIB) is one of the candidates to fabricate the nanoscale patterns, precision milling of nanoscale structures is not straightforward. Thus this poses challenges for novice FIB users. Optimal determination in FIB parameters is a crucial step to fabricate a desired nanoscale pattern. There are two main FIB parameters to consider, beam current (beam size) and dose (beam duration) for optimizing the milling condition. After fixing the dose, the proper beam current can be
more » ... current can be chosen considering both total milling time and resolution of the pattern. Then, using the chosen beam current, the metal nano hole structure can be perforated to the required depth by varying the dose. In this experiment, we found the adequate condition of 0.1 nC/μm 2 dose at 1 pA Ga ion beam current for 100 nm thickness perforation. With this condition, we perforated the periodic square array of elliptical nano holes.
doi:10.5757/jkvs.2013.22.5.262 fatcat:5wfgxh4qwnavfi6q365uzlleve