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VLSI CAD for emerging nanolithography
2012
Proceedings of Technical Program of 2012 VLSI Design, Automation and Test
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In this paper, we discuss emerging nanolithography technologies including double/multiple patterning, extreme ultraviolet lithography, electron-beam lithography, and their interactions with VLSI CAD. ...
Meanwhile, nanometer VLSI designs and mask synthesis have to be co-optimized with these process technologies to ensure high product quality (performance/power/area, etc.), yield, and throughput to make ...
these emerging nanolithography technologies. ...
doi:10.1109/vlsi-dat.2012.6212644
dblp:conf/vlsi-dat/PanGY12
fatcat:zm5e7gstrvgazloi5htdhbr2im
Design for Manufacturing With Emerging Nanolithography
2013
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems
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In this paper, we survey key design for manufacturing issues for extreme scaling with emerging nanolithography technologies, including double/multiple patterning lithography, extreme ultraviolet lithography ...
Index Terms-Design for manufacturing, double patterning, e-beam lithography (EBL), EUV lithography (EUVL), multiple patterning, nanolithography, physical design. ...
Puri, IBM, for their helpful discussions. ...
doi:10.1109/tcad.2013.2276751
fatcat:amxc565rjfg6bkliymbbbjczde
Introducing The Small World: Developing The Mems/Nanotechnology Curriculum
2009 Annual Conference & Exposition Proceedings
unpublished
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In addition, we have other related courses to support this program, such as EE 447: Semiconductor, EE 404: CMOS VLSI, EE 410: Bio-sensors, etc. ...
Our graduated students are well prepared for the industry in micro/nanotechnology fields. This program can also be helpful for the effort of the Connecticut Nanotechnology Curriculum Committee. ...
Through these ≠ Introduction to MEMS
≠ MEMS materials and properties
≠ Basic microfabrication techniques
≠ MEMS for industrial and automotive applications
≠ MEMS CAD design and simulation
≠ MEMS for ...
doi:10.18260/1-2--4555
fatcat:6zen2l5f5jhbxd3al2hschd2ii
Layered Manufacturing: Challenges and Opportunities
2002
Materials Research Society Symposium Proceedings
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LM is still a few years away from fully realizing its promise but its potential for manufacturing remains high. ...
For the high melting powder, a binder may be mixed in and, as the laser sweeps the layer, a bound shape emerges. ...
Both approaches are ideally suited for layer-by-layer fabrication and would benefit from the LM concept of CAD-based intelligent manufacturing. ...
doi:10.1557/proc-758-ll1.4
fatcat:obqlscmaznekpmy52kga2yxtf4
Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations
2010
Journal of Micro/Nanolithography
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Then, we present a comprehensive contact extraction methodology for analyzing process-induced CER effects on circuit performance. ...
contact extraction model, we first dissect the contact with a same distance, and then calculate the effective resistance considering both the shape weighting factor and the distance weighting factor for ...
= ω d · ω s · A from T
11:
end for
12:
invR + = invR C
13: end for
14: update totalR = ρ/invR
15: for each contact C ∈ pCNT do
16:
same sequence as nCNT
17: end for
18: update netlist ...
doi:10.1117/1.3504697
fatcat:kuqy2djhdfgevah2hmobtemily
iCORE Research Report: Volume 1
[article]
2005
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This project is involved with the development of the first comprehensive CAD tool for this promising emerging technology. ...
research centre for emerging Software Engineering technologies. ...
doi:10.11575/prism/10588
fatcat:lk7cme2jkbfn5nmbrots2tbe4m
iCORE Research Report: Volume 2
[article]
2005
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All in-vacuum nanolithography is being developed, at this point for one-off structures, to allow connection and testing of nanostructures. ...
We have had considerable initial success with a unique CAD tool (QCADesigner) for quantum cellular automata (QCA) architectures. ...
New Funds Acquired as Prime Investigator Funding secured this year includes $39,348 from an NSERC Equipment Grant for a Laser Cutting Facility for the RF Wafer Prober, an NSERC Discovery Grant for $37,320 ...
doi:10.11575/prism/10590
fatcat:fqw5arlqznafjh6gk7t3jueoji
The Russian Academy of Sciences, 2006 Update
[article]
2020
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The press was assigned to publish all kinds (except for ecclesiastical) of the literature in the country. ...
It was a state institution; while on a payroll, its members had to provide for the scientific and technical services of thee state. ...
information retrieval systems for different applications, CAD/ CAM systems, software tools for constructing applied packages. ...
doi:10.26153/tsw/10405
fatcat:tqi3ovf3uvefja5jxzi3e7x7ea
Single Cell analysis using AtomicForce Microscopy (AFM)
[article]
2011
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for biological cell studies based on nanoimprint lithography. ...
Replication of biological cells for the purpose of imaging and analysis under electron and scanning probe microscopy has facilitated the opportunity to study and examine some molecular processes and structures ...
board layout and other computer aided design (CAD) work. ...
doi:10.26021/1230
fatcat:dqtkpn5jxvbxlmq2em7ff7opcu
A Study on the Nature of Anomalous Current Conduction in Gallium Nitride
2005
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Silvaco software is a Computer Aided Design (CAD) package for electronic device applications. ...
Computational Fluid Dynamics (CFD) based CAD packages apply the same principles for fluid flow and aqueous chemical reactions. ...
doi:10.25772/05rv-je10
fatcat:lzoowzjhmfcq3god3uzyvdvnki