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VLSI CAD for emerging nanolithography

D. Z. Pan, Jhih-Rong Gao, Bei Yu
2012 Proceedings of Technical Program of 2012 VLSI Design, Automation and Test  
In this paper, we discuss emerging nanolithography technologies including double/multiple patterning, extreme ultraviolet lithography, electron-beam lithography, and their interactions with VLSI CAD.  ...  Meanwhile, nanometer VLSI designs and mask synthesis have to be co-optimized with these process technologies to ensure high product quality (performance/power/area, etc.), yield, and throughput to make  ...  these emerging nanolithography technologies.  ... 
doi:10.1109/vlsi-dat.2012.6212644 dblp:conf/vlsi-dat/PanGY12 fatcat:zm5e7gstrvgazloi5htdhbr2im

Design for Manufacturing With Emerging Nanolithography

David Z. Pan, Bei Yu, Jhih-Rong Gao
2013 IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems  
In this paper, we survey key design for manufacturing issues for extreme scaling with emerging nanolithography technologies, including double/multiple patterning lithography, extreme ultraviolet lithography  ...  Index Terms-Design for manufacturing, double patterning, e-beam lithography (EBL), EUV lithography (EUVL), multiple patterning, nanolithography, physical design.  ...  Puri, IBM, for their helpful discussions.  ... 
doi:10.1109/tcad.2013.2276751 fatcat:amxc565rjfg6bkliymbbbjczde

Introducing The Small World: Developing The Mems/Nanotechnology Curriculum

Xingguo Xiong, Linfeng Zhang, Junling Hu, Lawrence Hmurcik
2009 Annual Conference & Exposition Proceedings   unpublished
In addition, we have other related courses to support this program, such as EE 447: Semiconductor, EE 404: CMOS VLSI, EE 410: Bio-sensors, etc.  ...  Our graduated students are well prepared for the industry in micro/nanotechnology fields. This program can also be helpful for the effort of the Connecticut Nanotechnology Curriculum Committee.  ...  Through these ≠ Introduction to MEMS ≠ MEMS materials and properties ≠ Basic microfabrication techniques ≠ MEMS for industrial and automotive applications ≠ MEMS CAD design and simulation ≠ MEMS for  ... 
doi:10.18260/1-2--4555 fatcat:6zen2l5f5jhbxd3al2hschd2ii

Layered Manufacturing: Challenges and Opportunities

Khershed P. Cooper
2002 Materials Research Society Symposium Proceedings  
LM is still a few years away from fully realizing its promise but its potential for manufacturing remains high.  ...  For the high melting powder, a binder may be mixed in and, as the laser sweeps the layer, a bound shape emerges.  ...  Both approaches are ideally suited for layer-by-layer fabrication and would benefit from the LM concept of CAD-based intelligent manufacturing.  ... 
doi:10.1557/proc-758-ll1.4 fatcat:obqlscmaznekpmy52kga2yxtf4

Modeling and characterization of contact-edge roughness for minimizing design and manufacturing variations

Yuansheng Ma
2010 Journal of Micro/Nanolithography  
Then, we present a comprehensive contact extraction methodology for analyzing process-induced CER effects on circuit performance.  ...  contact extraction model, we first dissect the contact with a same distance, and then calculate the effective resistance considering both the shape weighting factor and the distance weighting factor for  ...  = ω d · ω s · A from T 11: end for 12: invR + = invR C 13: end for 14: update totalR = ρ/invR 15: for each contact C ∈ pCNT do 16: same sequence as nCNT 17: end for 18: update netlist  ... 
doi:10.1117/1.3504697 fatcat:kuqy2djhdfgevah2hmobtemily

iCORE Research Report: Volume 1 [article]

Norman C. Et Al. Beaulieu, University Of Calgary, University Of Calgary
2005
This project is involved with the development of the first comprehensive CAD tool for this promising emerging technology.  ...  research centre for emerging Software Engineering technologies.  ... 
doi:10.11575/prism/10588 fatcat:lk7cme2jkbfn5nmbrots2tbe4m

iCORE Research Report: Volume 2 [article]

Caelli, Terry (Ed.), University Of Calgary, University Of Calgary
2005
All in-vacuum nanolithography is being developed, at this point for one-off structures, to allow connection and testing of nanostructures.  ...  We have had considerable initial success with a unique CAD tool (QCADesigner) for quantum cellular automata (QCA) architectures.  ...  New Funds Acquired as Prime Investigator Funding secured this year includes $39,348 from an NSERC Equipment Grant for a Laser Cutting Facility for the RF Wafer Prober, an NSERC Discovery Grant for $37,320  ... 
doi:10.11575/prism/10590 fatcat:fqw5arlqznafjh6gk7t3jueoji

The Russian Academy of Sciences, 2006 Update [article]

Iuri S. Osipov, Austin, The University Of Texas At
2020
The press was assigned to publish all kinds (except for ecclesiastical) of the literature in the country.  ...  It was a state institution; while on a payroll, its members had to provide for the scientific and technical services of thee state.  ...  information retrieval systems for different applications, CAD/ CAM systems, software tools for constructing applied packages.  ... 
doi:10.26153/tsw/10405 fatcat:tqi3ovf3uvefja5jxzi3e7x7ea

Single Cell analysis using AtomicForce Microscopy (AFM) [article]

Fahmi B. Samsuri, University Of Canterbury
2011
for biological cell studies based on nanoimprint lithography.  ...  Replication of biological cells for the purpose of imaging and analysis under electron and scanning probe microscopy has facilitated the opportunity to study and examine some molecular processes and structures  ...  board layout and other computer aided design (CAD) work.  ... 
doi:10.26021/1230 fatcat:dqtkpn5jxvbxlmq2em7ff7opcu

A Study on the Nature of Anomalous Current Conduction in Gallium Nitride

Joshua Spradlin
2005
Silvaco software is a Computer Aided Design (CAD) package for electronic device applications.  ...  Computational Fluid Dynamics (CFD) based CAD packages apply the same principles for fluid flow and aqueous chemical reactions.  ... 
doi:10.25772/05rv-je10 fatcat:lzoowzjhmfcq3god3uzyvdvnki