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Room temperature plasma oxidation: A new process for preparation of ultrathin layers of silicon oxide, and high dielectric constant materials

J.C. Tinoco, M. Estrada, H. Baez, A. Cerdeira
2006 Thin Solid Films  
In this paper we present basic features and oxidation law of the room temperature plasma oxidation, (RTPO), as a new process for preparation of less than 2 nm thick layers of SiO 2 , and high-k layers  ...  These parameters are related to the physical phenomena occurring inside the plasma, during oxidation.  ...  Acknowledgements We want to thank Olga Gallegos and Enriqueta Aguilar for sample preparation, Dr. Gabriel Romero for titanium process, Maricela Flores for electrical characterizations and to M. Sc.  ... 
doi:10.1016/j.tsf.2005.08.351 fatcat:rhrcsrj4zne7vbhxrybosimr6y

Visible light-emitting devices with Schottky contacts on an ultrathin amorphous silicon layer containing silicon nanocrystals

S. Fujita, N. Sugiyama
1999 Applied Physics Letters  
At room temperature, the PL signals with peak photon energy of about 1.9 eV and very weak intensity were obtained from a-Si layers 3 nm thick heated for 1 min in both nitrogen and oxygen.  ...  MQW͒ composed of 40 couples of silicon nitride (SiN x )/Si NC formed by plasma-enhanced CVD and laser annealing. 13 The EL in these cases was strong enough to be seen with the naked eye.  ...  At room temperature, the PL signals with peak photon energy of about 1.9 eV and very weak intensity were obtained from a-Si layers 3 nm thick heated for 1 min in both nitrogen and oxygen.  ... 
doi:10.1063/1.123007 fatcat:jg4p3acnvrdn7bpfcxaaqghewy

Synthesis and Preparation of Oxide Ultrathin Films [chapter]

Sergio Valeri, Stefania Benedetti
2012 Oxide Ultrathin Films  
This mechanism has been employed for ion beam synthesis of a buried oxide layer in silicon.  ...  Buried Oxide Layers Point defects in silicon induced by ion implantation have been investigated with regard to doping in silicon device processing [154] .  ... 
doi:10.1002/9783527640171.ch1 fatcat:ts5bockh7rdffk3ynytkwczaj4

Bipolar resistive switching in amorphous titanium oxide thin film

Hu Young Jeong, Jeong Yong Lee, Min-Ki Ryu, Sung-Yool Choi
2010 Physica Status Solidi. Rapid Research Letters  
Using isothermal and temperature-dependent electrical measurements, we investigated the resistive switching mechanism of amorphous titanium oxide thin films deposited by a plasma-enhanced atomic layer  ...  We found a bipolar resistive switching behavior in the high temperature region (> 140 K), and two activation energies of shallow traps, 0.055 eV and 0.126 eV in the ohmic current regime.  ...  Using isothermal and temperature-dependent electrical measurements, we investigated the resistive switching mechanism of amorphous titanium oxide thin films deposited by a plasma-enhanced atomic layer  ... 
doi:10.1002/pssr.200903383 fatcat:xgffbmeh6rchnlccujb433i5ey

Chemical vapour deposition of zeolitic imidazolate framework thin films

Ivo Stassen, Mark Styles, Gianluca Grenci, Hans Van Gorp, Willem Vanderlinden, Steven De Feyter, Paolo Falcaro, Dirk De Vos, Philippe Vereecken, Rob Ameloot
2015 Nature Materials  
Suitable film deposition methods are crucial to leverage MOFs in this field.  ...  Furthermore, we demonstrate how MOF-CVD enables previously inaccessible routes such as lift-off patterning and depositing MOF films on fragile features.  ...  Acknowledgements The authors are grateful to the Agency of Innovation by Science and Technology (IWT) for support in SBO  ... 
doi:10.1038/nmat4509 pmid:26657328 fatcat:poj6mp74xbgqjblc5qtifgusn4

Ultrathin Oxide Wrapping of Plasmonic Nanoparticles via Colloidal Electrostatic Self-Assembly and their Enhanced Performances [chapter]

Haoming Bao, Hongwen Zhang, Guangqiang Liu, Weiping Cai
2018 Plasmonics  
Based on the self-assembly strategy, laser ablation of metal targets in liquid medium was conducted at room temperature to one-pot fabricate the oxide-wrapped plasmonic NPs.  ...  Ultrathin and uniform oxide layer-wrapped plasmonic nanoparticles (NPs) have been expected in the fields of light energy conversion and optical sensing fields.  ...  According to the proposed electrostatic self-assembly mechanism, it should also obtain the ultrathin SnO 2 layer-wrapped Au NPs, which is confirmed in Figure 6a .  ... 
doi:10.5772/intechopen.79573 fatcat:qnpuc7ggvzd6fbhgdl5g3zhnsa

Printed array of thin-dielectric metal-oxide-metal (MOM) tunneling diodes

Mario Bareiß, Andreas Hochmeister, Gunther Jegert, Ute Zschieschang, Hagen Klauk, Rupert Huber, Dirk Grundler, Wolfgang Porod, Bernhard Fabel, Giuseppe Scarpa, Paolo Lugli
2011 Journal of Applied Physics  
Simulations have been carried out to extract the static device parameters and have confirmed the existence of a dipole layer at the aluminum/aluminum oxide interface of the printed tunneling diodes.  ...  Capacitance measurements have shown that the permittivity of the ultrathin aluminum oxide film is smaller than that of bulk aluminum oxide.  ...  The research leading to these results has received funding from the Institute for Advanced Study (IAS), the International Graduate School for Science and Engineering (IGSSE) at the Technische Universität  ... 
doi:10.1063/1.3615952 fatcat:jblzdnggujhcrjuymjd6hp4d64

Highlights from recent literature

1999 Gold Bulletin  
Neutron activation analysis has been applied to the determination of the elements Au, Cr, Fe, Ni and Zn released in sodium chloride solution and in a culture medium in which gold-coated studs were immersed  ...  The coating defects and corrosion effects on the stud surfaces were studied by SEM and energy dispersive spectroscopy analysis.  ...  nuclei are formed from the nitrides and/or oxides, and subjecting the nuclei to a heat treatment at 150-300°C to obtain the desired colour.  ... 
doi:10.1007/bf03214800 fatcat:6x7ez4akwvcwbl43ruyypbnude

Self-Assembled Monolayers (SAMs): Which Perspectives in Implant Dentistry?

Filiberto Mastrangelo, Giulia Fioravanti, Raimondo Quaresima, Raffaele Vinci, Enrico Gherlone
2011 Journal of Biomaterials and Nanobiotechnology  
Particulars are given to SAMs on titanium concerning surface morphology, chemical composition and affinity of specific head group for Ti surfaces (silanes, siloxane, phosphonates and phosphates).  ...  Their formation provides an alternative, highly innovative, to current traditional chemical treatments of the titanium surfaces.  ...  to dry at room temperature.  ... 
doi:10.4236/jbnb.2011.225064 fatcat:fz2zcod6a5eqlkyqvrbtdvm6h4

MG-63 and FetMSC Cell Response on Atomic Layer Deposited TiO2 Nanolayers Prepared Using Titanium Tetrachloride and Tetraisopropoxide

Denis Nazarov, Ilya Ezhov, Natalia Yudintceva, Ilya Mitrofanov, Maxim Shevtsov, Aida Rudakova, Maxim Maximov
2022 Coatings  
Titanium oxide nanocoatings were synthesized on the surface of monocrystalline silicon and ultra-fine-grained titanium by atomic layer deposition (ALD) using titanium tetrachloride (TiCl4) and titanium  ...  A significant influence of the precursor type and ALD temperature on the crystal structure, morphology, composition, and surface free energy of TiO2 nanocoatings was found.  ...  The authors are grateful to Ruslan Valiev for the provided samples of UFG titanium, Igor Kasatkin for XRD and XRR measurements, Vladimir Kalganov for SEM measurements, Denis Danilov for the TEM study,  ... 
doi:10.3390/coatings12050668 fatcat:rdjyi6uwjzb3pmiwm34cbsccb4

Plasma-Enhanced Chemical Vapor Deposition: Where we are and the Outlook for the Future [chapter]

Yasaman Hamedani, Prathyushakrishna Macha, Timothy J. Bunning, Rajesh R. Naik, Milana C. Vasudev
2016 Chemical Vapor Deposition - Recent Advances and Applications in Optical, Solar Cells and Solid State Devices  
Organic/inorganic monomers, which are used as precursors in the PECVD technique, undergo disintegration and radical polymerization while exposed to a high-energy plasma stream, followed by thin film deposition  ...  There are many hybrid techniques, which arise from CVD and are constantly evolving in order to modify the properties of the fabricated thin films.  ...  Acknowledgements The authors would like to acknowledge the Provost's office at the University of Dartmouth and AFOSR.  ... 
doi:10.5772/64654 fatcat:7dutdf3sqfda7ftfob65ifg3ly

Direct observation of microscopic change induced by oxygen vacancy drift in amorphous TiO2 thin films

Hu Young Jeong, Jeong Yong Lee, Sung-Yool Choi
2010 Applied Physics Letters  
2 / Al devices we investigate the microscopic change in amorphous titanium oxide films and interface layers after the set process according to film deposition temperatures.  ...  A titanium oxide film on an Al/ SiO 2 / Si substrate at a deposition rate of 0.45 Å/cycle was deposited by means of plasma-enhanced atomic layer deposition ͑PEALD͒ ͑ASM Genitech MP-1000͒.  ... 
doi:10.1063/1.3467854 fatcat:27hhy5elg5dbbl3m3cv23quaeu

Review of metal oxide films deposited by filtered cathodic vacuum arc technique

B.K. Tay, Z.W. Zhao, D.H.C. Chua
2006 Materials science & engineering. R, Reports  
The properties of various metal oxide thin films, such as titanium oxide, aluminum oxide, zinc oxide, zirconium oxide, transparent conducting oxides and other oxides, deposited by the FCVA are reviewed  ...  However, in the past decade, much effort had been focused on the elimination of macroparticles and the most successful approach is the use of curved magnetic filters to effectively separate the plasma  ...  Fig. 15 . 15 Raman spectra of titanium oxide thin films on silicon [103] . Fig. 16 . 16 FTIR spectra of titanium oxide thin films at various substrate temperatures [103] . Fig . 17.  ... 
doi:10.1016/j.mser.2006.04.003 fatcat:m76attqdbrdcrkmj4v6dtsyyvu

Atomic layer deposition of functional multicomponent oxides

Mariona Coll, Mari Napari
2019 APL Materials  
materials exhibit magnetic behavior, although room-temperature ferromagnetism was only confirmed in doped titanium oxide films. 91, 92 While the majority of applications for doped oxides by ALD are  ...  are needed. 28 In this approach, called plasma-enhanced or plasma-assisted ALD (PEALD, PA-ALD), the energetic oxygen plasma can also be used to reduce the deposition temperature and to enhance the film  ... 
doi:10.1063/1.5113656 fatcat:7rz7jhoxwzb3ta4yax6w5yojwa

Surface modification of titanium, titanium alloys, and related materials for biomedical applications

X LIU, P CHU, C DING
2004 Materials science & engineering. R, Reports  
This article reviews the various surface modification technologies pertaining to titanium and titanium alloys including mechanical treatment, thermal spraying, sol-gel, chemical and electrochemical treatment  ...  Therefore, in order to improve the biological, chemical, and mechanical properties, surface modification is often performed.  ...  and room temperature produces thermal oxides with thickness of 0.5-2.5 nm.  ... 
doi:10.1016/j.mser.2004.11.001 fatcat:wzugv7bkqnbgro3spsthje5u6e
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