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Hemocompatibility of diamondlike carbon–metal composite thin films
2006
Diamond and related materials
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We have investigated the hemocompatibility of diamondlike carbon-silver composite and diamondlike carbon-titanium composite thin films prepared using a multicomponent target pulsed laser deposition process ...
rich plasma. ...
Diamondlike carbon thin Diamond & Related Materials 15 (2006 ) 1941 -1948 www.elsevier.com/locate/diamond films exhibit atomic number densities greater than 3.19 g atom/ cm 3 , and may possess atomic ...
doi:10.1016/j.diamond.2006.05.013
fatcat:c3d3hjjwmvbvlezeopulwj6nxe
Optical and mechanical properties of plasma‐beam‐deposited amorphous hydrogenated carbon
1996
Journal of Applied Physics
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It is demonstrated that plasma-beam-deposited diamondlike a-C:H has similar properties as material deposited with conventional plasma-enhanced chemical-vapor-depositions techniques under energetic ion ...
Amorphous hydrogenated carbon films have been deposited on crystalline silicon and on glass from an expanding thermal plasma. ...
Comparison with diamondlike a-C:H deposited from other PECVD techniques under energetic ion bombardment reveals that plasma-beam-deposited diamondlike a-C:H exhibits similar material quality. ...
doi:10.1063/1.363567
fatcat:lalnqeq4dfb3zljvxbecrahnym
Electrochemical and antimicrobial properties of diamondlike carbon-metal composite films
2006
Diamond and related materials
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We have deposited diamondlike carbonsilver (DLC-Ag), diamondlike carbon-platinum (DLC-Pt), and diamondlike carbon-silverplatinum (DLC-AgPt) thin films using a multicomponent target pulsed laser deposition ...
The diamondlike carbon-silver film possesses hardness and Young's modulus values of 37 GPa and 331 GPa, respectively. ...
These studies were performed on seven diamondlike carbon-silver, diamondlike carbon-platinum, and diamondlike carbon-silverplatinum films deposited on Ti-Al-V substrates. ...
doi:10.1016/j.diamond.2005.08.031
fatcat:o2snltuflva65g2yckeo6om7yi
Plasma beam deposited amorphous hydrogenated carbon: Improved film quality at higher growth rate
1996
Applied Physics Letters
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I Properties of plasma beam deposited diamondlike a-C:H films and other PECVD techniques ͑Refs. 17-19͒. FIG. 2. ...
Also, the typical diamondlike properties of films deposited with other PECVD techniques are given. [17] [18] [19] It is obvious that plasma beam deposited diamondlike a-C:H is of similar quality. ...
doi:10.1063/1.116904
fatcat:arbwndljqndsfauquxijj7qb5a
Low earth simulation and materials characterization
1993
Journal of Spacecraft and Rockets
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These materials include thin films of alu- minum, diamondlike carbon, and diamond, and also, bulk samples of potential thermal radiator materials made from graphite, pyro- lytic graphite/boron nitride, ...
and carbon fiber/carbon composites. ...
doi:10.2514/3.25478
fatcat:d3ljtt7zpbbnbk4ivlrhvytld4
Low-Pressure, Metastable Growth of Diamond and "Diamondlike" Phases
1988
Science
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plasma-assisted chemical vapor deposition (PACVD); and DC plasma discharge. ...
Diamondlike Carbons (a-C) and Other Phases Hydrogen-free diamondlike carbon films with a majority of Sp3 carbon sites can also be formed (96, 97) . ...
doi:10.1126/science.241.4868.913
pmid:17731439
fatcat:h7no3mhqmfgcdojq73bgeh6zp4
Thin film materials exposure to low Earth orbit aboard Space Shuttle
1995
Journal of Spacecraft and Rockets
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.* Samples 8 and 10 were deposited from methane in an argon plasma at University of Nebraska-Lincoln (UNL) by Plasma Enhanced Chemical Vapor Deposition (PECVD).* Samples 7 and 9
SYNOWICKI ET AL.: MATERIALS ...
Thanks to Ned Ianno of the UNL CMOMR for use of his dia- mondlike carbon deposition equipment, and to Carlos R. Morrison and Sam Alterovitz of NASA-Lewis for contributing diamondlike carbon films. ...
doi:10.2514/3.26580
fatcat:n6dk25j6rfcsdeabkmcxpqqvoa
Laser deposition of diamondlike carbon films at high intensities
1995
Applied Physics Letters
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Unhydrogenated diamondlike carbon ͑DLC͒ thin films have been deposited by laser ablation of graphite, using a high power Ti: sapphire solid state laser system. ...
Kinetic energies carried by the carbon ions in the laser induced plasma were measured through time-of-flight ͑TOF͒ spectroscopy. ...
Roy Clarke and Sangeeta Murugkar at the University of Michigan, Donggu Lee and Don Gilbert at the University of Florida for their help in this study. ...
doi:10.1063/1.114853
fatcat:cuikphlx2jdxlaxoj2sv7nysye
Cathodoluminescence of diamondlike films deposited by glow discharge
1990
Journal of Applied Physics
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caHed "diamondlike carbon" (DLC) and possesses variable amounts of Sp2 and Sp3 bonds. ...
The strength of the emission is related to the morphology of the substrate. The strongest emission was observed in a material deposited on a completely roughened substrate. ...
doi:10.1063/1.346306
fatcat:6ov4fr2mbzfilpj7o3lmwlana4
Fast deposition of amorphous carbon films by an expanding cascaded arc plasma jet
1995
Journal of Applied Physics
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Using an expanding cascaded arc plasma jet, amorphous hydrogenated and fluorohydrogenated carbon films were deposited on silicon, glass, and steel substrates at high rates of tens of nanometers per second ...
By the admixture of hydrogen in the deposition plasma diamondlike films were produced with a larger band gap of 2.2 eV. ...
More details on the deposition reactor, the reactor settings, and the relations with the deposited materials are given elsewhere. ...
doi:10.1063/1.360637
fatcat:pzhpd7vcgbgk3po4pk2netlwje
Optical properties of amorphous C/diamond thin films
1992
Journal of Applied Physics
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It has been found that the optical band gap is not related to the hydrogen content in the films and varies according to the dc self bias developed during deposition. ...
Amorphous C/diamond films have been prepared by rf plasma enhanced vapor deposition from a CHdAr gas mixture. ...
Mung and Dr. I. Watson for the IR measurements and analysis. ...
doi:10.1063/1.351792
fatcat:33kwxipr7fcppfzf632sxaiadq
On the structural properties ofa‐Si1−xCx:H thin films
1996
Journal of Applied Physics
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On the other hand, the EXAFS spectra of films with higher carbon content ͑xϾ50 at. %͒ and deposited under "starving" plasma regime show Si-C distances similar to crystalline SiC ͑c-SiC͒. ...
The EXAFS and XANES results show the crucial influence of the "starving" plasma deposition conditions on the structural properties of wide-gap a-Si 1Ϫx C x :H films and are consistent with the FTIR and ...
However, for high CH 4 partial pressures, these materials generally show a decrease in the optical gap, which is related to the formation of graphitelike sp 2 C-C bonding instead of diamondlike sp 3 C-C ...
doi:10.1063/1.361029
fatcat:u5u7w7nwmrfkngvcwtajk6sdr4
Effect of chamber pressure and atmosphere on the microstructure and nanomechanical properties of amorphous carbon films prepared by pulsed laser deposition
2001
Journal of Vacuum Science & Technology. A. Vacuum, Surfaces, and Films
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The amorphous carbon films were deposited in various atmospheres such as nitrogen and argon at different chamber pressures. ...
We have investigated the effect of chamber pressure and atmosphere on the microstructure and nanomechanical properties of amorphous carbon thin films prepared by pulsed laser deposition. ...
ACKNOWLEDGMENT This work was sponsored by NSF through the National Science Foundation Center for Advanced Materials and Smart Structures ͑NSF-CAMSS͒ affiliated with North Carolina A&T State University ...
doi:10.1116/1.1322641
fatcat:awqp2bcj6rba3hgd7vcyxaoesa
Residual stress analysis by different bias voltage of DLC films on AISI 4050 alloy steel
2015
Revista Brasileira de Aplicações de Vácuo
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Residual internal stresses are generated during cooling stage after deposition process, due to always present difference in thermal expansion coefficient of film and substrate materials. ...
Thin films are one the best choice to improve materials properties. ...
Thin films are generally produced from carbon containing materials and deposited and fixed on another material, the substrate. ...
doi:10.17563/rbav.v34i3.974
fatcat:7gz4jmku7rdhvf3zh7teyh3mwe
Electron cyclotron resonance plasma ion source for material depositions
1998
Review of Scientific Instruments
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An electron cyclotron resonance ͑ECR͒ plasma has been used in conjunction with solid metal targets for deposition of various metal and oxide compounds. ...
High plasma densities over 4 ϫ10 11 cm Ϫ3 were measured by interferometry. An iron deposition rate of 2000 Å/mn has been achieved. ...
. 21 There are two major methods of diamondlike carbon synthesis by the ECR plasma process. ...
doi:10.1063/1.1148938
fatcat:zu2xvpt5gzg4nhwfn2djm633ky
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