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Monolithic 3D Semiconductor Footprint Scaling Exploration Based on VFET Standard Cell Layout Methodology, Design Flow, and EDA Platform

Chung-Kuan Cheng, Chia-Tung Ho, Daeyeal Lee, Bill Lin
2022 IEEE Access  
While a full-blown paradigm shift on layout methodology, design flow, and electronic design automation (EDA) platform is not available now, we describe in this article three specific baby steps that can  ...  Pitch shrinkage and standard cell height reduction via design technology co-optimization with design rules have sustained this scaling until recently.  ...  . 4) The conventional layout methodology, design flow, and EDA platform, which uses small-functional standard cells for flexibility, and two-staged two-dimensional block-level layout (i.e., cell placement  ... 
doi:10.1109/access.2022.3184008 fatcat:n2frqqvmlbesxhhwf6qgfdw4vq