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Maskless multibeam laser irradiation enables large-area nanostructure fabrication

Minghui Hong
2009 SPIE Newsroom  
for vertical electronic devices. 3 By combining LIL and catalytic etching, large-area 3D silicon nanowire and nanofin arrays can be fabricated, which can subsequently serve as molds for imprinting of  ...  Laser-interference and laser microlens-array lithography provide significant resolution advances towards high-speed nanomanufacturing.  ...  for vertical electronic devices. 3 By combining LIL and catalytic etching, large-area 3D silicon nanowire and nanofin arrays can be fabricated, which can subsequently serve as molds for imprinting of  ... 
doi:10.1117/2.1200905.1594 fatcat:xoy7zuvwxbfnpmq3qwsv5eoowm

Nanoscale lithography of LaAlO3/SrTiO3wires using silicon stencil masks

S Azimi, J Song, C J Li, S Mathew, M B H Breese, T Venkatesan
2014 Nanotechnology  
These nanostencils can be patterned with arbitrary feature shapes with openings hundreds of micrometers wide connected to long channels of less than 100 nm in width.  ...  We have developed a process to fabricate low-stress, fully crystalline silicon nanostencils, based on ion irradiation and the electrochemical anodization of p-type silicon.  ...  Acknowledgments This work was partly performed at SSLS under NUS Core Support C-380-003-003-001 and National Research Foundation project NRF-CRP8-2011-06.  ... 
doi:10.1088/0957-4484/25/44/445301 pmid:25302579 fatcat:thdw7wxr6bcczalhxjt6qduzge

Large-Scale Hierarchical Organization of Nanowires for Functional Nanosystems

Dongmok Whang, Song Jin, Charles M. Lieber
2004 Japanese Journal of Applied Physics  
First, hierarchically-assembled nanowire arrays have been used as masks to define nanometer scale metal lines and surface features over large areas.  ...  Second, hierarchically-assembled nanowire arrays have been used to fabricate fully-scalable centimeter size arrays of field-effect transistors in high yields without requiring alignment of individual nanowires  ...  Acknowledgments This work was supported by the Defense Advanced Research Projects Agency, Air Force Office of Scientific Research, the National Cancer Institute, and the Ellison Medical Foundation.  ... 
doi:10.1143/jjap.43.4465 fatcat:lf7y5eh2cjelnbou22lpse2mam

Spun-wrapped aligned nanofiber (SWAN) lithography for fabrication of micro/nano-structures on 3D objects

Zhou Ye, Amrinder S. Nain, Bahareh Behkam
2016 Nanoscale  
throughput (>10 −7 m 2 s −1 ) and large-area fabrication of sub-50 nm to several micron features with high pattern fidelity.  ...  and devices that require precisely designed multiscale features. † Electronic supplementary information (ESI) available: SWAN lithography on silicon; comparison of SWAN lithography and state-of-the-art  ...  Damico for their help with preliminary experiments and insightful discussions. We thank Z. Morrow and P. Sharma for assistance with photography.  ... 
doi:10.1039/c6nr03323g pmid:27283144 fatcat:kvc3uxofcjgp3gdnveey3jjdgm

Emerging Maskless Nanolithography Based on Novel Diffraction Gratings [chapter]

Guanxiao Cheng, Yong Yang, Chao Hu, Ping Xu, Helun Song, Tingwen Xing, Max Q.-H.
2011 Recent Advances in Nanofabrication Techniques and Applications  
There are various forms of maskless lithography that include scanning electron-beam lithography, focused ion-beam lithography, multiaxis electron-beam lithography, interference lithography, maskless optical-projection  ...  The design and fabrication of photon sieve are illustrated with a low-numerical-aperture amplitude-photon sieve fabricated on a chrome-coated quartz plate by means of laser-beam lithographic process, which  ...  Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.  ... 
doi:10.5772/22265 fatcat:lmke5dtxjbdpddec4mbccgy2xy

High-energy Electron Beam Lithography for Nanoscale Fabrication [chapter]

Cen Shawn, Yoshiyuki Makiuchi, ChiiDong Che
2010 Lithography  
Due to the long penetration depth in the resist, high-energy EBL allows for the exposure of very thick resists, which are useful for forming nanostructures with large height-to-width ratios.  ...  The calculated distribution is of Gaussian shape, and the contribution of secondary-electron exposure is exponentially suppressed with increased incident beam energy.  ...  The first set of the Au line-array (bottom array) was made by EBL and the second set of line array patterns was exposed and aligned to the first one with high accuracy.  ... 
doi:10.5772/8179 fatcat:yc6fb6hmlrcgnbxkp4ryufiury

Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes

Haiming Guo, David Martrou, Tomaso Zambelli, Jérôme Polesel-Maris, Agnès Piednoir, Erik Dujardin, Sébastien Gauthier, Marc A. F. van den Boogaart, Lianne M. Doeswijk, Jürgen Brugger
2007 Applied Physics Letters  
Large scale AFM imaging, combined with the use of a high precision positioning table, allows inspecting the microelectrodes and positioning the nanoscale pattern with accuracy better than 100 nm.  ...  have been drilled by focused ion beam.  ...  After having deposited a metal film, large scale AFM images are acquired by scanning the X-Y table and the relative position of the deposited pattern and the AFM tip can be precisely measured.  ... 
doi:10.1063/1.2710473 fatcat:mpgrivuutjd4hagdnghrbk7yhu

Fabrication of Sub-Lithography-Limited Structures via Nanomasking Technique for Plasmonic Enhancement Applications

Stephen J. Bauman, Eric C. Novak, Desalegn T. Debu, Douglas Natelson, Joseph B. Herzog
2015 IEEE transactions on nanotechnology  
It also provides the unique ability to create sub-lithography limited nanostructures both with and without adjacent nanogaps.  ...  This technique increases the previously demonstrated capabilities by enabling fabrication of many nanogaps that are below the resolution limit of the lithography system over a wafer-scale area.  ...  Joseph Herzog, for giving me the opportunity to be a part of and help establish the Plasmonic Nano-optics research group here at the University of Arkansas.  ... 
doi:10.1109/tnano.2015.2457235 fatcat:sbjwzjbl2rd3jmevtw7iuzo5vi

Ultrafast laser manufacturing of nanofluidic systems

Felix Sima, Koji Sugioka
2021 Nanophotonics  
Among the nanofabrication technologies, ultrafast laser manufacturing is a promising tool for fabrication of nanofluidics due to its flexibility, versatility, high fabrication resolution and three dimensional  ...  Further advancement pushes to miniaturize the architectures to nanoscale in terms of both the sizes and the fluid dynamics for some specific applications including investigation of biological sub-cellular  ...  Electron-beam lithography (EBL) is one of the most used technologies to create patterned structures of nanoscale feature sizes with high-accuracy and flexibility in replication.  ... 
doi:10.1515/nanoph-2021-0159 fatcat:vdkb3uj6szgwpfqiodqzptr34a

Large-scale organic nanowire lithography and electronics

Sung-Yong Min, Tae-Sik Kim, Beom Joon Kim, Himchan Cho, Yong-Young Noh, Hoichang Yang, Jeong Ho Cho, Tae-Woo Lee
2013 Nature Communications  
Extremely fast nanolithography using printed semiconducting nanowire arrays provide a simple, reliable method of fabricating large-area and flexible nano-electronics.  ...  High-speed, large-area printing of highly aligned individual nanowires that allows control of the exact numbers of wires, and their orientations and dimensions is a significant challenge for practical  ...  By combining ONP and ONWL, we fabricated organic FETs with nanoscale channel length and channel width (Fig. 4a) .  ... 
doi:10.1038/ncomms2785 pmid:23653185 fatcat:utzzh2o6tzh2fn3ggit4far4um

Fabrication of nanoscale plasmonic structures and their applications to photonic devices and biosensors

Woo Kyung Jung, Kyung Min Byun
2011 Biomedical Engineering Letters  
In this review, we explored the fabrication and application of various metallic nanostructures that support localized surface plasmons.  ...  Principles and unique characteristics for individual nanopatterning technologies were demonstrated and relevant discussion focused on the process cost, throughput, and possibilities of large-area patterning  ...  ACKNOWLEDGMENTS This work was supported of Korea Science and Engineering Foundation (KOSEF) grant funded by the Korean government (MEST) (2011-0005517).  ... 
doi:10.1007/s13534-011-0026-7 fatcat:gdjfplawerbqld3bp5ylwul6oq

Bio-nanopatterning of Surfaces

Paula M. Mendes, Chun L. Yeung, Jon A. Preece
2007 Nanoscale Research Letters  
and viruses at the nanoscale on a broad range of substrates.  ...  Precise patterning of biomolecules on surfaces with nanometre resolution has great potential in many medical and biological applications ranging from molecular diagnostics to advanced platforms for fundamental  ...  Acknowledgements The authors acknowledge financial support from the European Community (NANO3D.NMP-CT-2005-014006) and the Engineering and Physical Sciences Research Council (EPSRC).  ... 
doi:10.1007/s11671-007-9083-3 pmid:21794192 pmcid:PMC3246385 fatcat:fnswovyv7ngtlcgjjjfjaojvqm

Incident angle dependence of nanogap size in suspended carbon nanotube shadow lithography

Nitin Chopra, Wentao Xu, Lance E De Long, Bruce J Hinds
2004 Nanotechnology  
Shadow widths and carbon nanotube diameters were directly observed by scanning transmission electron microscopy (STEM).  ...  Thus, surface migration assisted by the momentum of incident metal evaporant may be an important mechanism in nanoscale shadow lithography processes.  ...  Poly(methyl methacrylate) (PMMA) strip arrays were fabricated by electron beam lithography.  ... 
doi:10.1088/0957-4484/16/1/027 fatcat:zrljprv3rbd6pmsdan2o52zexi

Nanopillar array with a λ/11 diameter fabricated by a kind of visible CW laser direct lithography system

Chen Zhang, Kaige Wang, Jintao Bai, Shuang Wang, Wei Zhao, Fang Yang, Changzhi Gu, Guiren Wang
2013 Nanoscale Research Letters  
array with a λ/11 diameter fabricated by a kind of visible CW laser direct lithography system. Nanoscale Research Letters, 8(280), 2-9. http://dx.  ...  In this paper, nanopillar array with a pillar diameter far smaller than Abbe's diffraction limit is realized by a new kind of continuous wave (CW) laser direct lithography technology.  ...  Acknowledgments This work was supported by the Major Research Plan of the Natural Science Foundation of China (91123030) and the International Science and Technology Cooperation Program of China (2011DFA12220  ... 
doi:10.1186/1556-276x-8-280 pmid:23759031 pmcid:PMC3693884 fatcat:4hnrm5r6qzarharh73424g34mq

End-emitting nano organic light emitting diodes (OLEDs) with directional output

Cuiying Huang, Yiwei Zhang, Xinping Zhang
2020 Nanophotonics  
AbstractWe report a new strategy for the design of organic light emitting diodes (OLEDs), where nanoscale OLEDs are fabricated into a large-area periodic array with their emission propagating along the  ...  The OLED devices are then produced on the side walls of the template grating lines, where each device is carried by the back of a grating line and has a width of <300 nm and a height of about 270 nm.  ...  The width of the device should be a length scale defined by the overlap between the Al and Au nanostrips along the side wall of the grating lines.  ... 
doi:10.1515/nanoph-2020-0145 fatcat:hbenvfvtkrabjpl7g5hwf4dg2q
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