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Maskless multibeam laser irradiation enables large-area nanostructure fabrication
2009
SPIE Newsroom
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for vertical electronic devices. 3 By combining LIL and catalytic etching, large-area 3D silicon nanowire and nanofin arrays can be fabricated, which can subsequently serve as molds for imprinting of ...
Laser-interference and laser microlens-array lithography provide significant resolution advances towards high-speed nanomanufacturing. ...
for vertical electronic devices. 3 By combining LIL and catalytic etching, large-area 3D silicon nanowire and nanofin arrays can be fabricated, which can subsequently serve as molds for imprinting of ...
doi:10.1117/2.1200905.1594
fatcat:xoy7zuvwxbfnpmq3qwsv5eoowm
Nanoscale lithography of LaAlO3/SrTiO3wires using silicon stencil masks
2014
Nanotechnology
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These nanostencils can be patterned with arbitrary feature shapes with openings hundreds of micrometers wide connected to long channels of less than 100 nm in width. ...
We have developed a process to fabricate low-stress, fully crystalline silicon nanostencils, based on ion irradiation and the electrochemical anodization of p-type silicon. ...
Acknowledgments This work was partly performed at SSLS under NUS Core Support C-380-003-003-001 and National Research Foundation project NRF-CRP8-2011-06. ...
doi:10.1088/0957-4484/25/44/445301
pmid:25302579
fatcat:thdw7wxr6bcczalhxjt6qduzge
Large-Scale Hierarchical Organization of Nanowires for Functional Nanosystems
2004
Japanese Journal of Applied Physics
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First, hierarchically-assembled nanowire arrays have been used as masks to define nanometer scale metal lines and surface features over large areas. ...
Second, hierarchically-assembled nanowire arrays have been used to fabricate fully-scalable centimeter size arrays of field-effect transistors in high yields without requiring alignment of individual nanowires ...
Acknowledgments This work was supported by the Defense Advanced Research Projects Agency, Air Force Office of Scientific Research, the National Cancer Institute, and the Ellison Medical Foundation. ...
doi:10.1143/jjap.43.4465
fatcat:lf7y5eh2cjelnbou22lpse2mam
Spun-wrapped aligned nanofiber (SWAN) lithography for fabrication of micro/nano-structures on 3D objects
2016
Nanoscale
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throughput (>10 −7 m 2 s −1 ) and large-area fabrication of sub-50 nm to several micron features with high pattern fidelity. ...
and devices that require precisely designed multiscale features. † Electronic supplementary information (ESI) available: SWAN lithography on silicon; comparison of SWAN lithography and state-of-the-art ...
Damico for their help with preliminary experiments and insightful discussions. We thank Z. Morrow and P. Sharma for assistance with photography. ...
doi:10.1039/c6nr03323g
pmid:27283144
fatcat:kvc3uxofcjgp3gdnveey3jjdgm
Emerging Maskless Nanolithography Based on Novel Diffraction Gratings
[chapter]
2011
Recent Advances in Nanofabrication Techniques and Applications
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There are various forms of maskless lithography that include scanning electron-beam lithography, focused ion-beam lithography, multiaxis electron-beam lithography, interference lithography, maskless optical-projection ...
The design and fabrication of photon sieve are illustrated with a low-numerical-aperture amplitude-photon sieve fabricated on a chrome-coated quartz plate by means of laser-beam lithographic process, which ...
Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography. ...
doi:10.5772/22265
fatcat:lmke5dtxjbdpddec4mbccgy2xy
High-energy Electron Beam Lithography for Nanoscale Fabrication
[chapter]
2010
Lithography
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Due to the long penetration depth in the resist, high-energy EBL allows for the exposure of very thick resists, which are useful for forming nanostructures with large height-to-width ratios. ...
The calculated distribution is of Gaussian shape, and the contribution of secondary-electron exposure is exponentially suppressed with increased incident beam energy. ...
The first set of the Au line-array (bottom array) was made by EBL and the second set of line array patterns was exposed and aligned to the first one with high accuracy. ...
doi:10.5772/8179
fatcat:yc6fb6hmlrcgnbxkp4ryufiury
Nanostenciling for fabrication and interconnection of nanopatterns and microelectrodes
2007
Applied Physics Letters
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Large scale AFM imaging, combined with the use of a high precision positioning table, allows inspecting the microelectrodes and positioning the nanoscale pattern with accuracy better than 100 nm. ...
have been drilled by focused ion beam. ...
After having deposited a metal film, large scale AFM images are acquired by scanning the X-Y table and the relative position of the deposited pattern and the AFM tip can be precisely measured. ...
doi:10.1063/1.2710473
fatcat:mpgrivuutjd4hagdnghrbk7yhu
Fabrication of Sub-Lithography-Limited Structures via Nanomasking Technique for Plasmonic Enhancement Applications
2015
IEEE transactions on nanotechnology
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It also provides the unique ability to create sub-lithography limited nanostructures both with and without adjacent nanogaps. ...
This technique increases the previously demonstrated capabilities by enabling fabrication of many nanogaps that are below the resolution limit of the lithography system over a wafer-scale area. ...
Joseph Herzog, for giving me the opportunity to be a part of and help establish the Plasmonic Nano-optics research group here at the University of Arkansas. ...
doi:10.1109/tnano.2015.2457235
fatcat:sbjwzjbl2rd3jmevtw7iuzo5vi
Ultrafast laser manufacturing of nanofluidic systems
2021
Nanophotonics
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Among the nanofabrication technologies, ultrafast laser manufacturing is a promising tool for fabrication of nanofluidics due to its flexibility, versatility, high fabrication resolution and three dimensional ...
Further advancement pushes to miniaturize the architectures to nanoscale in terms of both the sizes and the fluid dynamics for some specific applications including investigation of biological sub-cellular ...
Electron-beam lithography (EBL) is one of the most used technologies to create patterned structures of nanoscale feature sizes with high-accuracy and flexibility in replication. ...
doi:10.1515/nanoph-2021-0159
fatcat:vdkb3uj6szgwpfqiodqzptr34a
Large-scale organic nanowire lithography and electronics
2013
Nature Communications
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Extremely fast nanolithography using printed semiconducting nanowire arrays provide a simple, reliable method of fabricating large-area and flexible nano-electronics. ...
High-speed, large-area printing of highly aligned individual nanowires that allows control of the exact numbers of wires, and their orientations and dimensions is a significant challenge for practical ...
By combining ONP and ONWL, we fabricated organic FETs with nanoscale channel length and channel width (Fig. 4a) . ...
doi:10.1038/ncomms2785
pmid:23653185
fatcat:utzzh2o6tzh2fn3ggit4far4um
Fabrication of nanoscale plasmonic structures and their applications to photonic devices and biosensors
2011
Biomedical Engineering Letters
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In this review, we explored the fabrication and application of various metallic nanostructures that support localized surface plasmons. ...
Principles and unique characteristics for individual nanopatterning technologies were demonstrated and relevant discussion focused on the process cost, throughput, and possibilities of large-area patterning ...
ACKNOWLEDGMENTS This work was supported of Korea Science and Engineering Foundation (KOSEF) grant funded by the Korean government (MEST) (2011-0005517). ...
doi:10.1007/s13534-011-0026-7
fatcat:gdjfplawerbqld3bp5ylwul6oq
Bio-nanopatterning of Surfaces
2007
Nanoscale Research Letters
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and viruses at the nanoscale on a broad range of substrates. ...
Precise patterning of biomolecules on surfaces with nanometre resolution has great potential in many medical and biological applications ranging from molecular diagnostics to advanced platforms for fundamental ...
Acknowledgements The authors acknowledge financial support from the European Community (NANO3D.NMP-CT-2005-014006) and the Engineering and Physical Sciences Research Council (EPSRC). ...
doi:10.1007/s11671-007-9083-3
pmid:21794192
pmcid:PMC3246385
fatcat:fnswovyv7ngtlcgjjjfjaojvqm
Incident angle dependence of nanogap size in suspended carbon nanotube shadow lithography
2004
Nanotechnology
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Shadow widths and carbon nanotube diameters were directly observed by scanning transmission electron microscopy (STEM). ...
Thus, surface migration assisted by the momentum of incident metal evaporant may be an important mechanism in nanoscale shadow lithography processes. ...
Poly(methyl methacrylate) (PMMA) strip arrays were fabricated by electron beam lithography. ...
doi:10.1088/0957-4484/16/1/027
fatcat:zrljprv3rbd6pmsdan2o52zexi
Nanopillar array with a λ/11 diameter fabricated by a kind of visible CW laser direct lithography system
2013
Nanoscale Research Letters
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array with a λ/11 diameter fabricated by a kind of visible CW laser direct lithography system. Nanoscale Research Letters, 8(280), 2-9. http://dx. ...
In this paper, nanopillar array with a pillar diameter far smaller than Abbe's diffraction limit is realized by a new kind of continuous wave (CW) laser direct lithography technology. ...
Acknowledgments This work was supported by the Major Research Plan of the Natural Science Foundation of China (91123030) and the International Science and Technology Cooperation Program of China (2011DFA12220 ...
doi:10.1186/1556-276x-8-280
pmid:23759031
pmcid:PMC3693884
fatcat:4hnrm5r6qzarharh73424g34mq
End-emitting nano organic light emitting diodes (OLEDs) with directional output
2020
Nanophotonics
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AbstractWe report a new strategy for the design of organic light emitting diodes (OLEDs), where nanoscale OLEDs are fabricated into a large-area periodic array with their emission propagating along the ...
The OLED devices are then produced on the side walls of the template grating lines, where each device is carried by the back of a grating line and has a width of <300 nm and a height of about 270 nm. ...
The width of the device should be a length scale defined by the overlap between the Al and Au nanostrips along the side wall of the grating lines. ...
doi:10.1515/nanoph-2020-0145
fatcat:hbenvfvtkrabjpl7g5hwf4dg2q
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