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E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System [article]

Bei Yu and Kun Yuan and Jhih-Rong Gao and David Z. Pan
2015 arXiv   pre-print
In this paper, we prove that the overlapping aware stencil planning (OSP) problem is NP-hard.  ...  Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system.  ...  Shiyan Hu at Michigan Technological University and Zhao Song at University of Texas for helpful comments.  ... 
arXiv:1502.00621v1 fatcat:bfzoeqhvkze55pqlevunmma7ru

E-BLOW: E-Beam Lithography Overlapping aware Stencil Planning for MCC System [article]

Bei Yu and Kun Yuan and Jhih-Rong Gao and David Z. Pan
2014 arXiv   pre-print
In this paper, we present E-BLOW, a tool to solve the overlapping aware stencil planning (OSP) problems in MCC system.  ...  Experimental results show that, compared with previous works, E-BLOW demonstrates better performance for both conventional EBL system and MCC system.  ...  Overlapping aware Stencil Planning (OSP) for MCC system: Given a set of character candidate C C , select a subset C CP out of C C as characters, and place them on the stencil.  ... 
arXiv:1402.2435v1 fatcat:kec4fm5gu5gljh5tji3ogfbn4e