Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography

by Takahiro Kozawa, Julius Joseph Santillan, Toshiro Itani

Published in Journal of Photopolymer Science and Technology (Fotoporima Konwakai shi) by Technical Association of Photopolymers, Japan.

2014 Volume 27, p11-19

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Year 2014
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DOI 10.2494/photopolymer.27.11

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ISSN-L: 0914-9244

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