BibTeX
CSL-JSON
MLA
Harvard
FinFET process refinements for improved mobility and gate work function engineering
release_xkndshbxyfcvlcakbriobshgli
by
Yang-Kyu Choi,
Leland Chang,
P. Ranade,
Jeong-Soo Lee,
Daewon Ha,
S. Balasubramanian,
A. Agarwal,
M. Ameen,
Tsu-Jae King,
J. Bokor
Released
as a paper-conference
by IEEE.
Archived Files and Locations
application/pdf
359.3 kB
file_wuqkeotrizbu3pchrhmazwpbh4
| |
application/pdf
636.9 kB
file_bwt7nczfujaaljxno2c4yna4ae
|
web.archive.org (webarchive) www-device.eecs.berkeley.edu:80 (web) |
Read Archived PDF
Preserved and Accessible
Type
Stage
paper-conferenceStage
unknown
Work Entity
access all versions, variants, and formats of this works (eg, pre-prints)
access all versions, variants, and formats of this works (eg, pre-prints)
Cite This
Lookup Links
oaDOI/unpaywall (OA fulltext)
Crossref Metadata (via API)
Worldcat
wikidata.org
CORE.ac.uk
Semantic Scholar
Google Scholar
Crossref Metadata (via API)
Worldcat
wikidata.org
CORE.ac.uk
Semantic Scholar
Google Scholar