@inproceedings{mizoguchi_nakarai_abe_nowak_kawasuji,_tanaka_watanabe_hori_kodama_shiraishi_et al._2017, 
  title={Development of 250W EUV light source for HVM lithography}, 
  DOI={10.1117/12.2261075}, 
  publisher={SPIE}, 
  author={Mizoguchi and Nakarai and Abe and Nowak and Kawasuji, and Tanaka and Watanabe and Hori and Kodama and Shiraishi and et al.}, 
  editor={Kaierle and Heinemann}, 
  year={2017}, 
  month={Feb}
  }