Random Deposition Model with a Constant Capture Length release_rev_88d5a963-f63b-4cb5-9dd6-a2f2bd731a2e

by Paolo Politi, Yukio Saito

Released as a article .

2004  

Abstract

We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance \ell, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.
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Type  article
Stage   submitted
Date   2004-09-02
Version   v1
Language   en ?
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