Random Deposition Model with a Constant Capture Length
release_rev_88d5a963-f63b-4cb5-9dd6-a2f2bd731a2e
by
Paolo Politi,
Yukio Saito
2004
Abstract
We introduce a sequential model for the deposition and aggregation of
particles in the submonolayer regime. Once a particle has been randomly
deposited on the substrate, it sticks to the closest atom or island within a
distance \ell, otherwise it sticks to the deposition site. We study this model
both numerically and analytically in one dimension. A clear comprehension of
its statistical properties is provided, thanks to capture equations and to the
analysis of the island-island distance distribution.
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cond-mat/0409048v1
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