Fault-tolerant sub-lithographic design with rollback recovery release_rev_87e1af9c-8ff6-4b65-81fc-84c253579c73

by Helia Naeimi, André DeHon

Published in Nanotechnology by IOP Publishing.

2008   Volume 19, Issue 11, p115708

Type  article-journal
Stage   published
Date   2008-02-19
Container Metadata
Not in DOAJ
In Keepers Registry
ISSN-L:  0957-4484
Work Entity
access all versions, variants, and formats of this works (eg, pre-prints)
Revision

This is a specific, static metadata record, not necessarily linked to any current entity in the catalog.

Catalog Record
Revision: 87e1af9c-8ff6-4b65-81fc-84c253579c73
API URL: JSON