Simulation of Optical Constants Range of High-Transmittance Attenuated Phase-Shifting Masks Used in KrF Laser and ArF Laser

by Eunah Kim, Seong-yong Moon, Yong-hoon Kim, Hee-sun Yoon, Kwangsoo No

Published in Japanese Journal of Applied Physics by Japan Society of Applied Physics.

2000 Volume 39, Issue Part 1, No. 11, p6321-6328

application/pdf 215.8 kB `file_3fyyax453vaubldalrzdpuh2aa`
application/pdf 207.0 kB `file_kx57buzvhjdfrgb3skhcprkbdq`	web.archive.org (webarchive) koasas.kaist.ac.kr (web)

Preserved and Accessible

Type article-journal
Stage

published

Date 2000-11-15
Language en ^?

DOI 10.1143/jjap.39.6321

Journal Metadata
Not in DOAJ
In Keepers Registry
ISSN-L: 0021-4922

Work Entity
access all versions, variants, and formats of this works (eg, pre-prints)

Cite This

BibTeX
CSL-JSON
MLA
Harvard

Lookup Links

oaDOI/unpaywall (OA fulltext)
Crossref Metadata (via API)
Worldcat
SHERPA/RoMEO (journal policies)
wikidata.org
CORE.ac.uk
Semantic Scholar
Google Scholar

Catalog Record
Revision: 86f20dfa-7c87-4058-b039-1b0174f07d42
API URL: JSON

Simulation of Optical Constants Range of High-Transmittance Attenuated Phase-Shifting Masks Used in KrF Laser and ArF Laser release_k4cacuruc5fcxdmehpg2zykmdq