Growth of high quality nitride semiconductors by sputtering and its application to device fabrication

by Hiroshi FUJIOKA, Kohei UENO, Atsushi KOBAYASHI, Jitsuo OHTA

Published in Oyobuturi by The Japan Society of Applied Physics.

Volume 86, Issue 7, p576-580

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DOI 10.11470/oubutsu.86.7_576

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ISSN-L: 0369-8009

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Growth of high quality nitride semiconductors by sputtering and its application to device fabrication スパッタリング法による高品質窒化物半導体の形成とデバイス応用 release_k2crvmpmxfdxna6bp25zo2qx64