BibTeX
CSL-JSON
MLA
Harvard
Rapid Plasma Etching for Fabricating Fused Silica Microchannels
release_g4tgw3dtbvfofloelxz63oz5iq
by
Kyojiro MORIKAWA,
Kazuki MATSUSHITA,
Takehiko TSUKAHARA
Published
in Analytical Sciences
by Japan Society for Analytical Chemistry.
2017 Volume 33, Issue 12, p1453-1456
Archived Files and Locations
application/pdf
827.0 kB
file_pcpj2hslpjhdbhtma72ntqj7r4
|
web.archive.org (webarchive) www.jstage.jst.go.jp (repository) |
Read Archived PDF
Preserved and Accessible
Container Metadata
Open Access Publication
Not in DOAJ
In ISSN ROAD
In Keepers Registry
ISSN-L:
Open Access Publication
Not in DOAJ
In ISSN ROAD
In Keepers Registry
ISSN-L:
0910-6340
Work Entity
access all versions, variants, and formats of this works (eg, pre-prints)
access all versions, variants, and formats of this works (eg, pre-prints)
Cite This
Lookup Links
oaDOI/unpaywall (OA fulltext)
Crossref Metadata (via API)
Worldcat
SHERPA/RoMEO (journal policies)
wikidata.org
CORE.ac.uk
Semantic Scholar
Google Scholar
Crossref Metadata (via API)
Worldcat
SHERPA/RoMEO (journal policies)
wikidata.org
CORE.ac.uk
Semantic Scholar
Google Scholar