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D-1 反応性スパッタ法による窒化アルミニウム薄膜の作製とその特性(バルク波・表面波デバイス)
D-1 Preparation and Characteristics of Aluminum Nitride Thin Films by Reactive Sputtering
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by
Keigo Nagao,
Eiji Masui,
Takuya Maruyama,
Kousuke Nishimura,
Tetsuo Yamada
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in Proceedings of Symposium on Ultrasonic Electronics
by Institute for Ultrasonic Elecronics.
Volume 25, Issue 0, p149-150
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Crossref Metadata (via API)
Worldcat
SHERPA/RoMEO (journal policies)
wikidata.org
CORE.ac.uk
Semantic Scholar
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