Reaction Mechanisms of Free Radical Photosensitive Materials.(I)

by Takuji MIWA, Toshio ISHIKAWA

Published in Journal of The Society of Photographic Science and Technology of Japan by THE SOCIETY OF PHOTOGRAPHY AND IMAGING OF JAPAN.

1975 Volume 38, Issue 4, p360-370

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Year 1975
Language ja ^?

DOI 10.11454/photogrst1964.38.360

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ISSN-L: 0369-5662

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Reaction Mechanisms of Free Radical Photosensitive Materials.(I) 遊離基感光材の反応機構 (I) release_b3itd7qhz5fhzog6cxge4bummq