Resist and Transfer Free Patterned CVD Graphene Growth on ALD Molybdenum Carbide Nano Layers release_4lpjpbqb2reddfobawlfz3elbe

Abstract

Multilayer graphene (MLG) films were grown chemical vapour deposition (CVD) on molybdenum carbide (MoC_x) substrates. We fabricated the catalytic MoC_x films by plasma enhanced atomic layer deposition. The mechanism of graphene growth is studied and analysed for amorphous and crystalline MoC_x films. In addition, we present a complete bottom up patterned graphene growth (GG) on pre-patterned MoC_x ALD performed at 50ºC. Selective CVD GG eliminates the need to pattern or transfer the graphene film to retain its pristine, as grown, qualities. Furthermore, we fabricated MLG directly on 100 nm suspended SiN membrane. We demonstrate these qualities with characterisation of the MLG using Raman spectroscopy, and analyse the samples by scanning electron microscopy and X-ray diffraction measurements. The techniques of graphene device manufacturing demonstrated here pave the path for large scale production of graphene applications.
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